Magnetic lens and electron beam deflection system

Electricity: measuring and testing – Measuring – testing – or sensing electricity – per se – With rotor

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250310, 250396ML, H01J 37141, H01J 37147, H01J 37256

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active

049124056

ABSTRACT:
A magnetic lens for use in an electron beam test probe system which includes an electron beam which travels along an electron beam column axis to reach the surface of a specimen which is to be examined. The magnetic lens focuses the electron beam to a selected point on the surface of the specimen. This magnetic lens also collects and collimates the secondary electrons produced in response to the electron beam bombardment of the specimen. The magnetic lens includes deflection coils for selecting the point on the specimen surface at which the electron beam is focused. The magnetic lens generates a magnetic field having a first region of intense magnetic flux substantially coincident with the selected point on the specimen surface and a second region of lesser uniform magnetic flux in which the magnetic flux lines are parallel to the electron beam column axis. This field is generated by the combination of a stationary magnetic field and a deflection magnetic field. The stationary magnetic field is modified by the deflection magnetic field which shifts the effective axis of the magnetic lens from the position of the electron beam column axis to a position which intersects the specimen at said selected point. The deflection magnetic field also results in the region of maximum magnetic flux being shifted to said point on the surface.

REFERENCES:
patent: 3474245 (1969-10-01), Kimura et al.
patent: 4376249 (1983-03-01), Pfeiffer et al.
patent: 4426577 (1984-01-01), Koike et al.
patent: 4437009 (1984-03-01), Yamazaki
patent: 4514638 (1985-04-01), Lischke et al.
J. Vac. Sci. Technol., vol. 19, No. 4, Pfeiffer et al., "Advanced Deflection Concept for Large Area, High Resolution E-Beam Lithography," Nov. 1981, pp. 1058-1063.

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