Magnetic frictionless gimbal for a polishing apparatus

Details Magnetic frictionless gimbal for a polishing apparatus Magnetic frictionless gimbal for a polishing apparatus

1998-09-14

2000-09-19

Utech, Benjamin L.

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

438692, H01L 21302, H01L 21461

Patent

active

061211427

ABSTRACT:
The present invention provides, for use with a polishing apparatus, a carrier structure comprising a first magnetic body, a second magnetic body, and a retaining ring. In one advantageous embodiment, the first magnetic body has a first side coupleable to the polishing apparatus, and a second side. The second magnetic body has a first side proximate and juxtaposed the second side of the first magnetic body. The second magnetic body is coupled to the first magnetic body to allow undulant motion with respect to the first magnetic body. The first and second magnetic bodies are configured to have a like polarity. The retaining ring is coupled to the second side of the second magnetic body and forms a retaining cavity configured to receive an object to be polished. Thus, the first and second magnetic bodies may cooperate to form a frictionless gimbal.

REFERENCES:
patent: 5242524 (1993-09-01), Leach et al.
patent: 5559428 (1996-09-01), Li et al.
patent: 5607341 (1997-03-01), Leach
patent: 5618447 (1997-04-01), Sandhu
patent: 5882243 (1999-03-01), Das et al.

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