Superconductor technology: apparatus – material – process – High temperature devices – systems – apparatus – com- ponents,... – Semiconductor thin film device or thin film electric...
Patent
1993-09-01
1994-08-16
Hille, Rolf
Superconductor technology: apparatus, material, process
High temperature devices, systems, apparatus, com- ponents,...
Semiconductor thin film device or thin film electric...
257 36, 257 34, 307306, 307245, 307541, 505853, 505865, H01L 3922, H03K 338
Patent
active
053389433
ABSTRACT:
A magnetic flux-enhanced control line for a superconducting flux flow transistor (SFFT). The SFFT includes a pair of superconducting electrodes which provide a voltage output, a region of weakened superconductor connecting the electrodes and a control line. The region of weakened superconductor carries a current I.sub.body and the control line carries a current I.sub.Control. The control line further has a portion thereof proximate the weakened region for providing a localized magnetic field through the weakened region as a function of I.sub.Control. The magnetic flux through the weakened region induces vortices therein which have a resistance r.sub.o. The proximate portion of the control line forms a tortuous current path whereby the magnetic flux through the weakened region is increased for increasing r.sub.o so that the output voltage of the transistor is increased without increasing I.sub.Control.
REFERENCES:
patent: 3764863 (1973-10-01), Zappe
patent: 5019721 (1991-05-01), Martens et al.
patent: 5229655 (1993-07-01), Martens et al.
Rajeevakumar, "A Josephson Vortex-Flow Device." Appl. Phys. Lett. vol. 39, o. 5, 1 Sep. 1981, pp. 439-441.
"S-Parameter Measurements and Application for Superconducting Flux Flow Transistors", J. S. Martens et al., 1991, IEEE MTT-S Digest, pp. 1231-1234.
"Characteristics of Superconducting Flux-Flow Transistors", G. K. G. Hohenwarter et al., Mar. 1991, IEEE Transactions on Magnetics, vol. 27, No. 2, pp. 3297-3300.
"The Universal Magnetic Field Dependence of the Critical Current Density in High-T.sub.e Ceramics", Fisher et al. and Properties of Critical Current Density in Heterostructures of Y.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-y /Y.sub.1 Ba.sub.2 (Cu.sub.1-x Ni.sub.x).sub.3 O.sub.7-y Superconducting Films, both in AIP Conference Proceedings 251, Superconductivity and Its Applications, American Institute of Physics, 1992.
"Thin Film Processing and Device Fabrication in the T1-Ca-Ba-Cu-O System", J. S. Martens et al., Progress in High-Temperature Superconducting Transistors and Other Devices-SPIE vol. 1394, pp. 140-149.
Cadotte, Jr. Roland
Cummings Michael
Rachlin Adam
Wilber William
Anderson William H.
Hille Rolf
Saadat Mahshid
The United States of America as represented by the Secretary of
Zelenka Michael
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