Magnetic film patterning by germanium or silicon diffusion

Stock material or miscellaneous articles – Circular sheet or circular blank – Recording medium or carrier

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

428611, 428641, 428692, 428694T, 428694GR, 428900, G11B 566, B32B 302, B32B 1500

Patent

active

055715915

ABSTRACT:
A method and apparatus for storing data and for reducing the magnetic moment of a ferromagnetic material is provided incorporating a magnetic film, a blanket or patterned film of germanium adjacent the magnetic film, and means for heating the interface of the two films to at least 200.degree. C. to permit diffusion of the germanium into the magnetic film and thereby reduce the magnetic moment. The invention overcomes the problem of forming recording tracks on storage media and patterning magnetic films for inductive and magneto resistive heads for retrieving data from moving storage media.

REFERENCES:
patent: 3420756 (1969-01-01), Tevajima
patent: 3902930 (1975-09-01), Sata et al.
patent: 3959799 (1976-05-01), Gambino et al.
patent: 4556597 (1985-12-01), Best et al.
patent: 4689260 (1987-08-01), Briska et al.
patent: 4746580 (1988-05-01), Bishop et al.
patent: 4774130 (1988-09-01), Endo et al.
patent: 4935278 (1990-06-01), Krounbi et al.
Bajorek et al, "Magnetically Discrete But Physically Continuous Recording Tracks", IBM Tec. Disc. Bull., 18, 1641 (1975).
M. Hansen, "Constitution of Binary Alloys", McGraw-Hill Book Co., 1958, pp. 684-691 and title page.
R. P. Elliott, "Constitution of Binary Alloys, First Supplement", McGraw-Hill Book Co., 1965, pp. 423-424 and title page.
F. R. Shunk, "Constitution of Binary Alloys, Second Supplement", McGraw-Hill Book Co., pp. 337-338 and title page.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Magnetic film patterning by germanium or silicon diffusion does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetic film patterning by germanium or silicon diffusion, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetic film patterning by germanium or silicon diffusion will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2013604

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.