Magnetic film patterning by germanium or silicon diffusion

Coating processes – Magnetic base or coating – Magnetic coating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427131, 427132, 427258, 427261, 427287, 4273762, 4273763, 4273766, 427399, 427404, 4274197, B05D 512

Patent

active

055851401

ABSTRACT:
A method and apparatus for storing data and for reducing the magnetic moment of a ferromagnetic material is provided incorporating a magnetic film, a blanket or patterned film of germanium adjacent the magnetic film, and means for heating the interface of the two films to at least 200.degree. C. to permit diffusion of the germanium into the magnetic film and thereby reduce the magnetic moment. The invention overcomes the problem of forming recording tracks on storage media and patterning magnetic films for inductive and magneto resistive heads for retrieving data from moving storage media.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Magnetic film patterning by germanium or silicon diffusion does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetic film patterning by germanium or silicon diffusion, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetic film patterning by germanium or silicon diffusion will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1989549

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.