Magnetic film forming apparatus which applies a parallel magneti

Details Magnetic film forming apparatus which applies a parallel magneti Magnetic film forming apparatus which applies a parallel magneti

1998-12-15

2000-08-08

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429815, 118728, C23C 1434, C23C 1600

Patent

active

060997060

ABSTRACT:
A magnetic film forming apparatus includes a film forming source to emit film-forming particles, a substrate holder for holding a substrate on which a magnetic film is formed with the film-forming particles, and a magnetic field generating circuit for applying the magnetic field to the substrate. The magnetic field generating circuit includes two pairs of magnets. Each pair of magnets is composed of two bar-shaped magnets combined in a line apart from each other by a gap of distance d. The pair of magnets have respective pairs of magnetic poles, with the direction of each pair of the magnetic poles being perpendicular to the longitudinal direction of the pair of magnets and having the same orientation. The two pairs of magnets are arranged apart from each other by the distance L in the horizontal x-y plane, substantially symmetrically to the vertical central y-axis of the substrate. This way, the magnetic film forming apparatus can be decreased in size and uniform parallelism of the magnetic field can be applied to the substrate.

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patent: 5804041 (1998-09-01), Hurwitt
patent: 5858180 (1999-01-01), Hsu

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