Magnetic field generator for use in sputtering apparatus

Details Magnetic field generator for use in sputtering apparatus Magnetic field generator for use in sputtering apparatus

1979-06-18

1981-01-06

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

042435056

ABSTRACT:
Apparatus for generating a uniform magnetic field in a cylindrical oriented post cathode. The vacuum chamber has a cylindrical wall of non-magnetic material and end walls of magnetic material. An array of bars of magnetic material is disposed to surround the vacuum chamber and to form a magnetic circuit including the end walls of the chamber and a region extending through and adjacent to the post cathode. Solenoid windings are positioned between the cylindrical wall of the chamber and the bars of magnetic material.

REFERENCES:
patent: 3458426 (1969-07-01), Rausch et al.
patent: 3855110 (1974-12-01), Quinn et al.
patent: 3897325 (1975-07-01), Aoshima et al.
patent: 3995187 (1976-11-01), Penfold et al.

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