Magnetic field generator for magnetron plasma, and plasma...

Details Magnetic field generator for magnetron plasma, and plasma... Magnetic field generator for magnetron plasma, and plasma...

2011-04-12

2011-04-12

Vinh, Lan (Department: 1713)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

C156S345460, C156S345490, C438S728000, C438S732000

Reexamination Certificate

active

07922865

ABSTRACT:
In a magnetic field generator for magnetron plasma generation which comprises a dipole-ring magnet with a plurality of columnar anisotropic segment magnets arranged in a ring-like manner, or in an etching apparatus and a method both of which utilize the magnetic field generator, the uniformity of plasma treatment over the entire surface of a wafer (workpiece) is improved by controlling the direction of the magnetic field relative to the working surface of the wafer (workpiece) which is subject to plasma treatment such as etching.

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