Magnetic field enhanced sputtering arrangement with vacuum treat

Details Magnetic field enhanced sputtering arrangement with vacuum treat Magnetic field enhanced sputtering arrangement with vacuum treat

1994-05-02

1996-02-13

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429809, C23C 1435

Patent

active

054909139

ABSTRACT:
A magnetic field enhanced sputtering arrangement and vacuum treatment apparatus includes an arrangement housing, on whose front face is mountable a target arrangement. A magnet carrier arrangement is rotatably supported about an axis in the arrangement housing. Magnetic flux of the magnet carrier penetrates through a region of the mounted target arrangement and the region is shifted through a relative rotational motion. An electric motor drive with a drive housing is connected to the arrangement housing so as to be torsion-tight therewith, and a rotor is rotatably supported in the drive housing, which, in turn, acts upon the magnet carrier arrangement. The drive housing forms the arrangement housing and the rotor is connected to the magnet carrier arrangement so as to be non-rotatable therewith, for a compact construction.

REFERENCES:
patent: 5252194 (1993-10-01), Demaray et al.

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