Magnetic deflectors and charged-particle-beam lithography system

Details Magnetic deflectors and charged-particle-beam lithography system Magnetic deflectors and charged-particle-beam lithography system

1997-02-18

1998-11-03

Nguyen, Kiet T.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

2504922, H01J 3730

Patent

active

058312706

ABSTRACT:
Magnetic deflectors for charged particle beams are provided. The magnetic deflectors comprise at least one pair of coils to provide high deflection sensitivity over large regions of uniform deflection without increasing the size of the magnetic core used by the deflectors. Charged-particle-beam lithography systems using such deflectors are also disclosed.

REFERENCES:
patent: 3911321 (1975-10-01), Wardly
patent: 4090077 (1978-05-01), Anger
patent: 4251728 (1981-02-01), Pfeiffer et al.
patent: 4362945 (1982-12-01), Riecke
patent: 4929838 (1990-05-01), Yasuda et al.
patent: 5276331 (1994-01-01), Oae et al.

Affiliated with

Also associated with

Rating

Magnetic deflectors and charged-particle-beam lithography system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetic deflectors and charged-particle-beam lithography system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetic deflectors and charged-particle-beam lithography system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-692152