Magnesium hydroxides having novel structure, process for product

Chemistry of inorganic compounds – Oxygen or compound thereof – Metal containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423497, 423639, C01F 514

Patent

active

041454049

ABSTRACT:
A novel magnesium hydroxide of the formula Mg(OH).sub.2 having (i) a strain in the <101> direction of not more than 3.0 .times. 10.sup.-3, (ii) a crystallite size in the <101> direction of more than 800 A, and (iii) a specific surface area of less than 20 m.sup.2 /g. The magnesium hydroxide, if desired as coated with anionic surfactants, is useful, for example, as fire retardants for thermoplastic synthetic resins and aqueous paints. The novel magnesium hydroxide is prepared by heating in an aqueous medium at an elevated pressure a novel basic magnesium chloride or nitrate of this invention expressed by the formula Mg(OH).sub.2-x A.sub.x .sup.. mH.sub.2 O wherein A is Cl or NO.sub.3, x is a number of more than 0 but less than 0.2, and m is a number of 0 to 6.

REFERENCES:
patent: 1405388 (1922-02-01), Bassett
patent: 1757592 (1930-06-01), Schleicher
patent: 2804375 (1957-08-01), Kamlet
patent: 3081155 (1963-03-01), Dinan
patent: 3218130 (1965-11-01), Kawai et al.
patent: 3711600 (1973-01-01), Storm et al.
Kirk-Othmer, Encyclopedia of Chemical Technology, Second Edition (Jun. 1969), vol. 12, pp. 724-731.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Magnesium hydroxides having novel structure, process for product does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnesium hydroxides having novel structure, process for product, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnesium hydroxides having novel structure, process for product will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-221034

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.