Distillation: apparatus – Apparatus – Systems
Patent
1996-06-07
1998-10-06
Bhat, Nina
Distillation: apparatus
Apparatus
Systems
202182, 2021851, 2021852, 2021856, 202205, 202206, B23K 112
Patent
active
058172173
DESCRIPTION:
BRIEF SUMMARY
TECHNICAL FIELD
The present invention relates to the technical field of using a secondary fluid in the vapor phase to confine a primary fluid that is adapted to perform treatment, in the broad meaning of the term, on various parts or objects.
It is necessary to keep the primary fluid in a limited space whenever the fluid is of a dangerous nature and/or has a high purchase price. By way of non-limiting example, the primary fluid may be perchloroethylene, trichloroethylene, any type of solvent, or a fluorocarbon type liquid.
An application of the invention lies, for example, in the field of cleaning or degreasing parts or objects.
Another particularly advantageous application of the invention lies in the technical field of mounting components in the broad sense, e.g. electronic, electrical, electromechanical, or mechanical type components on a support by means of additional material deposited at points associated with fixing pads of the components. More precisely, the invention can be used in the technique of assembling components by polymerization, in which the additional material is constituted by a polymer, or in the component soldering or reflow technique in which the additional material is constituted by an alloy.
PRIOR ART
In such techniques, it is known in general to use a treatment machine that includes a tank containing a liquid of the fluorocarbon type to be brought to a boiling temperature by heater means so as to produce a saturated and inert primary vapor in an assembly or soldering zone, which vapor is at a temperature that is slightly higher than the melting temperature of the additional material. The assembly or soldering zone is substantially defined between the level of the liquid and a coil used for condensing the primary vapor. The assembly or soldering zone is optionally surmounted by a preheating or cooling zone in which there exists a secondary vapor.
In its top portion, the tank includes a through opening that can be closed by a cover and that is there to allow a support carrying components to be assembled thereto to be inserted into the inside of the tank. Such a support is handled by a device that moves it and holds it successively in the preheating zone, the soldering zone, and the cooling zone. Thus, after the support has been held in the preheating zone for a determined length of time, the support is brought into contact with the primary vapor to cause the latent heat of condensation of the vapor to be transferred to the support and its associated components. This heat input raises the temperature of the support and the components quickly and uniformly to the temperature of the primary vapor, thereby causing the additional material to melt and consequently, depending on the technique used, causing the components to be soldered or polymerized.
By way of example, patent application Ser. No. 90/07,603 describes such a machine whose operation gives satisfaction in practice. Nevertheless, it should be observed that the secondary liquid is used is generally of the CFC type of the kind specified by the Montreal convention, and future use thereof is to be banned. Such a situation leads, more particularly, to two types of machine being used, one that operates with a single vapor phase, and another that operates with two.
A machine operating with a single vapor phase does not include a preheating or cooling zone constituted by a secondary vapor. In addition, the coil for cooling the primary vapor is omitted, with condensation of the primary vapor being provided by a refrigerated belt located at the top portion of the tank. The parts are generally preheated by infrared radiation. That solution presents drawbacks, insofar as cooling takes place in a non-inert ambient atmosphere that could harm the metallurgical quality of the soldering.
The other type of machine which operates with two vapor phases has a secondary vapor surmounting a primary vapor. The ban on CFCs means that a substitute secondary liquid is used, requiring the cooling fluid for condensing the primary vapor to be replaced
REFERENCES:
patent: 4348174 (1982-09-01), Spigarelli
patent: 4681249 (1987-07-01), Kondo
patent: 4801069 (1989-01-01), Ankrom et al.
patent: 4840305 (1989-06-01), Ankrom et al.
patent: 5220936 (1993-06-01), Pfahl, Jr. et al.
patent: 5304253 (1994-04-01), Grant
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