Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Patent
1985-08-19
1988-02-02
Hornsby, Harvey C.
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
134122R, 134131, 134 94, 198626, B08B 308
Patent
active
047223553
ABSTRACT:
Photoresist baked upon integrated circuit wafers is mechanically stripped therefrom. Wafers are unloaded from boats at the top of an elevator within a vertical housing filled with stripper solution, then deposited on a conveyor and carried through a horizontal housing also filled with stripper. The wafers are sprayed by high pressure stripper pumped through a nozzle at the end of their horizontal travel. The wafers are then transferred to another housing where they are rinsed, dried and, optionally, reloaded.
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Correia David
Moe Rolf
Caplan Julian
Hornsby Harvey C.
Moe Rolf
Stinson Frankie L.
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