Luster pigments based on reduced titania-coated silicate-based p

Details Luster pigments based on reduced titania-coated silicate-based p Luster pigments based on reduced titania-coated silicate-based p

1996-03-29

1998-03-31

Le, H. Thi

Stock material or miscellaneous articles

Coated or structually defined flake, particle, cell, strand,...

Particulate matter

427331, 427335, 427337, 428701, 428702, B32B 516, B05D 304

Patent

active

057336580

ABSTRACT:
Luster pigments obtainable by treating titania-coated silicate-based platelets at from 400.degree. to 900.degree. C. with a gas mixture comprising a vaporized organic compound and ammonia are useful for coloring paints, inks, including printing inks, plastics, glasses, ceramic products and decorative cosmetic preparations.

REFERENCES:
patent: 3087827 (1963-04-01), Klenke, Jr. et al.
patent: 4076555 (1978-02-01), Chu et al.
patent: 4192691 (1980-03-01), Armanini
patent: 4565581 (1986-01-01), Bernhard
patent: 4623396 (1986-11-01), Kimura et al.
patent: 4948631 (1990-08-01), Ostertag et al.
patent: 5061317 (1991-10-01), Korpi et al.
patent: 5116664 (1992-05-01), Kimura et al.
patent: 5156889 (1992-10-01), DeLuca
patent: 5246780 (1993-09-01), Farer et al.
patent: 5565025 (1996-10-01), Schraml-Marth
Japanese Patent Abstract, 61-192749, Feb. 21, 1985, English Abstract.
Patent Abstracts of Japan, vol. 9, No. 78 (C-274), Apr. 6, 1995.
Patent Abstracts of Japan, vol. 10, No. 31, (C-327), Feb. 6, 1986.
Database WPI, Week 8641 Derwent Pub., Ltd., London, GB; AN 86-267354--Aug. 1986.

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