LSI mask pattern edit apparatus with contour line intensity dist

Details LSI mask pattern edit apparatus with contour line intensity dist LSI mask pattern edit apparatus with contour line intensity dist

1997-03-13

1999-01-19

Brier, Jeffery

Computer graphics processing and selective visual display system

Display peripheral interface input device

Light pen for fluid matrix display panel

430 5, 430322, G09G 536, G03F 900, G03C 500

Patent

active

058618660

ABSTRACT:
An intensity distribution display method of displaying a intensity distribution of electromagnetic waves or charged particle beams fallen on a sample, is characterized by comprising the step of displaying the intensity distribution with the use of contour lines defined by Ie/(1+a.multidot.n/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer.

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patent: 5733687 (1998-03-01), Tanaka et al.
patent: 5736280 (1998-04-01), Tsudaka

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