LSI mask manufacturing system, LSI mask manufacturing method...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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C700S100000, C700S120000, C700S121000, C700S182000, C716S030000, C216S012000

Reexamination Certificate

active

07047094

ABSTRACT:
A computer implemented method for LSI mask manufacturing stores performance information of a lithography unit, connected to a network, in a lithography unit database. The method receives a lithography data and a lithography reservation condition from a user terminal connected to the network. The method stores the lithography data in a lithography data database. The method searches for a lithography unit matching to the lithography reservation condition, generating a list of lithography units, and sending the list to the user terminal. In addition, the method receives information of a lithography unit specified by the user terminal and sending a lithography request to the lithography unit specified by the user terminal.

REFERENCES:
patent: 4531191 (1985-07-01), Koyama
patent: 4538232 (1985-08-01), Koyama
patent: 5694325 (1997-12-01), Fukuda et al.
patent: 5861866 (1999-01-01), Inoue et al.
patent: 6051347 (2000-04-01), Tzu et al.
patent: 6347258 (2002-02-01), Hsu et al.
patent: 0 507 589 (1992-10-01), None
patent: 0 782 068 (1997-07-01), None
patent: 1 150 187 (2001-10-01), None
patent: 2002-075820 (2002-03-01), None
patent: 2002-092062 (2002-03-01), None
patent: 2002-149754 (2002-05-01), None
C. Ou-Yang et al., “Developing a computer shop floor control model for a CIM system—using object modeling technique”, Computers In Industry, Elsevier Science Publishers, Amsterdam, NL, vol. 41, No. 3, May 2000, pp. 213-238, XP004194248, ISSN: 0166-3615.
Semiconductor Equipment and Materials International: “SEMI P10-0301 Standard , pp. 1-3, 14, 17, 23, 26-27”, Mar. 2001, Semiconductor Equipment and Materials International, San Jose, CA XP002258143.
Michael B. McIlrath et al., “CAFE—The MIT Computer Aided Fabrication Environment”, IEEE CHMT '90 IEMT Symposium, Oct. 1, 1990, pp. 297-305, XP010092202.
Albert Hu et al., “Concurrent Deployment of Run by Run Controller Using Scc Framework”, Semiconductor Manufacturing Science Symposium, 1993, ISMSS 1993, IEEE/SEMI International San Francisco, CA, USA 19-20, Jul. 1993, New York, NY USA, IEEE, US, Jul. 19, 1993, pp. 125-132, XP010068452, ISBN: 0-7803-1212-0.
Douglas Scott, “Fab Automation—Where's the Payback?”, IEEE/SEMI Advanced Semiconductor Manufacturing Conference, Sep. 12, 2000, pp. 168-174, XP010531540.
Fan-Tien Cheng et al., “Modeling and analysis for an equipment manager of the manufacturing execution system in semiconductor packaging factories”, Systems , Man, and Cybernetics, 1998, 1998 IEEE International Conference on San Diego, CA, USA Oct. 11-14, 1998, New York, NY, USA, IEEE, US, Oct. 11, 1998, pp. 469-474, XP010310522, ISBN: 0-7803-4778-1.
Xiewei Bai et al., “Hierarchical real-time scheduling of a semiconductor fabrication facility”, IEEE/CHMT '90 IEMT Symposium, Oct. 1, 1990, pp. 312-317, XP010092204.
Eugene S. Meieran et al., “Applications of artificial intelligence in factory management”, IEEE/CHMT '89 IEMT Symposium, Sep. 25, 1989, pp. 18-22, XP010085260.

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