LPCVD reactor for high efficiency, high uniformity deposition

Details LPCVD reactor for high efficiency, high uniformity deposition LPCVD reactor for high efficiency, high uniformity deposition

1991-10-28

1992-08-04

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118725, C23C 1600

Patent

active

051349639

ABSTRACT:
An injector with a convex wall surface facing the susceptor directs vapor toward a wafer held by a susceptor producing a generally laminar flow across the surface of the wafer that in combination with the convex wall surface prevents formation of recirculation cells in the region between the wafer and the injector.

REFERENCES:
patent: 4798165 (1989-01-01), de Boer
patent: 4807562 (1989-02-01), Sandya
patent: 4820371 (1989-04-01), Rose
patent: 4825809 (1989-05-01), Mieno
patent: 4909914 (1990-03-01), Chiba et al.
patent: 4989541 (1991-02-01), Mikoshiba et al.
patent: 4991541 (1991-02-01), Sugata et al.
patent: 4993358 (1991-02-01), Mahawili

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