Low volume dispense unit and method of using

Details Low volume dispense unit and method of using Low volume dispense unit and method of using

2005-02-22

2005-02-22

Nicolas, Frederick (Department: 3754)

Dispensing

Nozzles, spouts and pouring devices

Antidrip

C222S063000, C222S334000, C222S389000

Reexamination Certificate

active

06857543

ABSTRACT:
A method for dispensing a chemical solution in the small-scale manufacture of semiconductors is provided. The method includes associating a dispensing unit with a semiconductor coat/develop track machine and a pneumatic syringe of a chemical solution with the dispensing unit. A dispensing pressure is applied to the pneumatic syringe. The flow control diaphragm is opened to allow the dispensing pressure to drive the chemical solution from the dispensing nozzle, while the drip prevention diaphragm is moved from a first position to a second position. The flow control diaphragm is closed to prevent the dispensing pressure from driving the chemical solution from the dispensing nozzle, while the drip prevention diaphragm is returned to the first position to generate a suck-back force in the flow path at the dispensing nozzle.

REFERENCES:
patent: 4597719 (1986-07-01), Tano
patent: 4874444 (1989-10-01), Satou et al.
patent: 5167837 (1992-12-01), Snodgrass et al.
patent: 5516429 (1996-05-01), Snodgrass et al.
patent: 5599394 (1997-02-01), Yabe et al.
patent: 5772899 (1998-06-01), Snodgrass et al.
patent: 5878918 (1999-03-01), Liao et al.
patent: 5913455 (1999-06-01), La et al.
patent: 5950924 (1999-09-01), Hatakeyama et al.
patent: 6062442 (2000-05-01), Yang et al.
patent: 6105829 (2000-08-01), Snodgrass et al.
patent: 6109881 (2000-08-01), Snodgrass et al.
patent: 6251293 (2001-06-01), Snodgrass et al.
patent: 6332924 (2001-12-01), Shim et al.
patent: 6419841 (2002-07-01), Snodgrass et al.
patent: 6478547 (2002-11-01), Savard et al.
patent: 6598765 (2003-07-01), Pagel et al.
patent: 6602382 (2003-08-01), Matsuyama et al.
IntelliGen Dispense System with Impact LHVD Filter: For Point-of-Use photochemical Dispense from Millipore Worldwide.

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