Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1974-02-13
1976-04-20
Kaplan, G. L.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
23230B, 230230R, 204180G, B01K 500, G01N 3100
Patent
active
039517764
ABSTRACT:
A low-voltage apparatus for demonstrating antigens in body liquids by cross-migration electrophoresis. The apparatus comprises a container filled with a buffer solution, which container has an anode and a cathode chamber and houses a gel-carrying tray. Recesses for receiving antigens and antibodies are provided in the gel and arranged to lie opposite each other in pairs at a distance of between 2 and 5 mm. The gel has a horizontal heat-exchange surface area of at least 50 cm.sup.2. The gel layer reaction zone between the recesses is between 0.5 and 1.5 mm thick and has a cross-sectional area of between 100 and 150 mm.sup.2. The apparatus permits a current passage of 100 milliampere, resulting in a current density of 0.7 milliampere/mm.sup.2 in the gel layer reaction zone.
REFERENCES:
patent: 3674678 (1972-07-01), Post, Jr. et al.
patent: 3773646 (1973-11-01), Mandle et al.
Nanto et al., "Optimal Cond. in Starch-Gel Elecphor. of Heat Denatured Collagen," Jrnl. Amer. Leather Chemists Assoc., Vol. LX, No. 2, Feb., 1965, pp. 63-71.
Eder Gerald
Eibl Johann
Molinari Ewald
Kaplan G. L.
Medizinische Produkte Immuno Aktiengesellschaft fur Chemish
Prescott A. C.
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