Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1996-11-14
1999-09-21
Lusignan, Michael
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427100, 4271263, 427422, 427427, B05D 512, B05D 102
Patent
active
059551402
ABSTRACT:
This invention has enabled a new, simple thin film nanoporous dielectric fabrication method. In general, this invention uses glycerol, or another low volatility compound, as a solvent. This new method allows thin film aerogels/low density xerogels to be made without supercritical drying, freeze drying, or a surface modification step before drying. Thus, this invention allows production of nanoporous dielectrics at room temperature and atmospheric pressure, without a separate surface modification step. Although this new method allows fabrication of aerogels without substantial pore collapse during drying, there may be some permanent shrinkage during aging and/or drying. This invention allows controlled porosity thin film nanoporous aerogels to be deposited, gelled, aged, and dried without atmospheric controls. In another aspect, this invention allows controlled porosity thin film nanoporous aerogels to be deposited, gelled, rapidly aged at an elevated temperature, and dried with only passive atmospheric controls, such as limiting the volume of the aging chamber.
REFERENCES:
patent: 4230803 (1980-10-01), Weidenbach et al.
patent: 4704299 (1987-11-01), Wielonski et al.
patent: 4713233 (1987-12-01), Marsh et al.
patent: 4851150 (1989-07-01), Hench et al.
patent: 4954327 (1990-09-01), Blount
patent: 5076980 (1991-12-01), Nogues et al.
patent: 5097317 (1992-03-01), Fujimoto et al.
patent: 5207814 (1993-05-01), Cogliati et al.
patent: 5236874 (1993-08-01), Pintchovski
patent: 5242647 (1993-09-01), Poco
patent: 5244691 (1993-09-01), Valente et al.
patent: 5271955 (1993-12-01), Maniar
patent: 5275796 (1994-01-01), Tillotson et al.
patent: 5294480 (1994-03-01), Mielke et al.
patent: 5342648 (1994-08-01), MacKenzie et al.
patent: 5368887 (1994-11-01), Hoshino et al.
patent: 5391364 (1995-02-01), Cogliati
patent: 5409683 (1995-04-01), Tillotson et al.
patent: 5470802 (1995-11-01), Gnade et al.
patent: 5472913 (1995-12-01), Havemann et al.
patent: 5488015 (1996-01-01), Havemann et al.
patent: 5494858 (1996-02-01), Gnade et al.
patent: 5496527 (1996-03-01), Yokogawa et al.
patent: 5504042 (1996-04-01), Cho et al.
patent: 5523615 (1996-06-01), Cho et al.
patent: 5525857 (1996-06-01), Gnade et al.
patent: 5536965 (1996-07-01), Beratan et al.
patent: 5548159 (1996-08-01), Jeng
patent: 5585136 (1996-12-01), Barrow et al.
patent: 5593495 (1997-01-01), Masuda et al.
patent: 5601869 (1997-02-01), Scott et al.
patent: 5643642 (1997-07-01), Oishi et al.
V.S. Klimenko, L.A. Kulik, and V.V. Vashchinskaya, Dependence of the Composition and Structure of Silicic Acid Xerogels on the Nature of the Solvent, 1986, Ukrainskii Khimicheskii Zhurnal, vol. 52, No. 12, pp. 1247-1251.
Norges Tekniske Hogskole, Preparation and Characterization of Transparent, Monolithic Silica Xerogels with Low Density, Jan. 1993. Cursory Consideration.
D. Basmadjian, G. N. Fulford, B.I. Parsons, and D.S. Montgomery, The Control of the Pore, Volume and Pore Size Distribution in Alumina and Silica Gels by the Addition of Water Soluble Organic Polymers Dec. 1962, Journal of Catalysis, vol. 1, No. 6, pp. 547-563. Cursory Consideration.
Siv Haereid, Preparation and Characterization of Transparent, Monolithic Silica Xerogels with Low Density, Jan. 1993, Norges Tekniske Hogskole Universiteteti I Trondheim.
H. Yokogawa, M. Yokoyama, Hydrophobic Silica Aerogels, Journal of Non-Crystalline Solids 186 (1995) 23-29.
Ackerman William C.
Gnade Bruce E.
Jeng Shin-Puu
Johnston Gregory P.
Maskara Alok
Chen Bret
Denker David
Donaldson Richard L.
Holland Robby T.
Lusignan Michael
LandOfFree
Low volatility solvent-based method for forming thin film nanopo does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Low volatility solvent-based method for forming thin film nanopo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low volatility solvent-based method for forming thin film nanopo will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-78002