Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...
Reexamination Certificate
2007-07-24
2007-07-24
Sellers, Robert (Department: 1712)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Mixing of two or more solid polymers; mixing of solid...
C523S201000, C523S205000, C523S466000, C523S467000, C525S065000, C525S114000, C525S487000
Reexamination Certificate
active
10911908
ABSTRACT:
A no flow fluxing underfill having a hardener component comprising a phenolic component and an anhydride component in a molar ratio of phenolic component to anhydride component of between about 0.1:1 and about 2:1; or between about 0.8:1 and about 1.2:1. An underfill preparation method involving blending an epoxy component and a phenolic component, heating the blend, and cooling the blend, prior to incorporation of an anhydride component.
REFERENCES:
patent: 3356645 (1967-12-01), Warren
patent: 3418333 (1968-12-01), Warren
patent: 3813379 (1974-05-01), Brouwers et al.
patent: 5128746 (1992-07-01), Pennisi et al.
patent: 5376403 (1994-12-01), Capote et al.
patent: 5473091 (1995-12-01), Ichiroku et al.
patent: 5543585 (1996-08-01), Booth et al.
patent: 5601675 (1997-02-01), Hoffmeyer et al.
patent: 5703406 (1997-12-01), Kang
patent: 5783867 (1998-07-01), Belke, Jr. et al.
patent: 5985043 (1999-11-01), Zhou et al.
patent: 5985456 (1999-11-01), Zhou et al.
patent: 6063828 (2000-05-01), Ma et al.
patent: 6100114 (2000-08-01), Milkovich et al.
patent: 6121689 (2000-09-01), Capote et al.
patent: 6168972 (2001-01-01), Wang et al.
patent: 6180696 (2001-01-01), Wong et al.
patent: 6194788 (2001-02-01), Gilleo et al.
patent: 6228678 (2001-05-01), Gilleo et al.
patent: 6228681 (2001-05-01), Gilleo et al.
patent: 6238223 (2001-05-01), Cobbley et al.
patent: 6274650 (2001-08-01), Cui
patent: 6297560 (2001-10-01), Capote et al.
patent: 6323062 (2001-11-01), Gilleo et al.
patent: 6350841 (2002-02-01), Schultz et al.
patent: 6358354 (2002-03-01), Patil
patent: 6380322 (2002-04-01), Wong et al.
patent: 6395124 (2002-05-01), Oxman et al.
patent: 6399178 (2002-06-01), Chung
patent: 6399426 (2002-06-01), Capote et al.
patent: 6458472 (2002-10-01), Konarski et al.
patent: 6467676 (2002-10-01), Wang
patent: 6632893 (2003-10-01), Konarski et al.
patent: 6706417 (2004-03-01), Konarski et al.
patent: 7166491 (2007-01-01), Wilson et al.
patent: 7213739 (2007-05-01), Wilson et al.
patent: 2001/0000929 (2001-05-01), Gilleo
patent: 2001/0003058 (2001-06-01), Gilleo et al.
patent: 2001/0017414 (2001-08-01), Gilleo
patent: 2002/0014703 (2002-02-01), Capote et al.
patent: 2002/0019075 (2002-02-01), Brand
patent: 2002/0020491 (2002-02-01), Price et al.
patent: 2002/0025602 (2002-02-01), Jiang et al.
patent: 2002/0031868 (2002-03-01), Capote et al.
patent: 2002/0089067 (2002-07-01), Crane et al.
patent: 2003/0111519 (2003-06-01), Kinney et al.
patent: 55-98848 (1980-07-01), None
patent: 57-40963 (1982-03-01), None
patent: 60-11525 (1985-01-01), None
patent: 60-190418 (1985-09-01), None
patent: 60-190418 (1985-09-01), None
patent: 60-219756 (1985-11-01), None
patent: 4-68019 (1992-03-01), None
patent: 4-249525 (1992-09-01), None
patent: 5-214074 (1993-08-01), None
patent: 6-49329 (1994-02-01), None
patent: 6-228279 (1994-08-01), None
patent: 10-135255 (1998-05-01), None
patent: WO 99/04430 (1999-01-01), None
Chemical abstracts registry No. 115-27-5 for chlorendic anhydrdide, 1974.
Chemical abstracts registry No. 2386-87-0 for 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 1974.
Lee, H. and Neville, K., Handbook of Epoxy Resins 1982 Reissue, 1982, pp. 5-18, McGraw-Hill, NY.
Blank, Z He and Picci, M., “Catalysis of the Epoxy-Carboxyl Reaction” Proceeding, Int. Waterborne, High-Solids and Powder Coatings Symposium, Feb. 21-23, 2001, New Orleans, LA.
Hurley James M.
Wilson Mark
Ye Xiaoyun
Fry's Metals, Inc.
Sellers Robert
Senniger Powers
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