Low voiding no flow fluxing underfill for electronic devices

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C523S201000, C523S205000, C523S466000, C523S467000, C525S065000, C525S114000, C525S487000

Reexamination Certificate

active

10911908

ABSTRACT:
A no flow fluxing underfill having a hardener component comprising a phenolic component and an anhydride component in a molar ratio of phenolic component to anhydride component of between about 0.1:1 and about 2:1; or between about 0.8:1 and about 1.2:1. An underfill preparation method involving blending an epoxy component and a phenolic component, heating the blend, and cooling the blend, prior to incorporation of an anhydride component.

REFERENCES:
patent: 3356645 (1967-12-01), Warren
patent: 3418333 (1968-12-01), Warren
patent: 3813379 (1974-05-01), Brouwers et al.
patent: 5128746 (1992-07-01), Pennisi et al.
patent: 5376403 (1994-12-01), Capote et al.
patent: 5473091 (1995-12-01), Ichiroku et al.
patent: 5543585 (1996-08-01), Booth et al.
patent: 5601675 (1997-02-01), Hoffmeyer et al.
patent: 5703406 (1997-12-01), Kang
patent: 5783867 (1998-07-01), Belke, Jr. et al.
patent: 5985043 (1999-11-01), Zhou et al.
patent: 5985456 (1999-11-01), Zhou et al.
patent: 6063828 (2000-05-01), Ma et al.
patent: 6100114 (2000-08-01), Milkovich et al.
patent: 6121689 (2000-09-01), Capote et al.
patent: 6168972 (2001-01-01), Wang et al.
patent: 6180696 (2001-01-01), Wong et al.
patent: 6194788 (2001-02-01), Gilleo et al.
patent: 6228678 (2001-05-01), Gilleo et al.
patent: 6228681 (2001-05-01), Gilleo et al.
patent: 6238223 (2001-05-01), Cobbley et al.
patent: 6274650 (2001-08-01), Cui
patent: 6297560 (2001-10-01), Capote et al.
patent: 6323062 (2001-11-01), Gilleo et al.
patent: 6350841 (2002-02-01), Schultz et al.
patent: 6358354 (2002-03-01), Patil
patent: 6380322 (2002-04-01), Wong et al.
patent: 6395124 (2002-05-01), Oxman et al.
patent: 6399178 (2002-06-01), Chung
patent: 6399426 (2002-06-01), Capote et al.
patent: 6458472 (2002-10-01), Konarski et al.
patent: 6467676 (2002-10-01), Wang
patent: 6632893 (2003-10-01), Konarski et al.
patent: 6706417 (2004-03-01), Konarski et al.
patent: 7166491 (2007-01-01), Wilson et al.
patent: 7213739 (2007-05-01), Wilson et al.
patent: 2001/0000929 (2001-05-01), Gilleo
patent: 2001/0003058 (2001-06-01), Gilleo et al.
patent: 2001/0017414 (2001-08-01), Gilleo
patent: 2002/0014703 (2002-02-01), Capote et al.
patent: 2002/0019075 (2002-02-01), Brand
patent: 2002/0020491 (2002-02-01), Price et al.
patent: 2002/0025602 (2002-02-01), Jiang et al.
patent: 2002/0031868 (2002-03-01), Capote et al.
patent: 2002/0089067 (2002-07-01), Crane et al.
patent: 2003/0111519 (2003-06-01), Kinney et al.
patent: 55-98848 (1980-07-01), None
patent: 57-40963 (1982-03-01), None
patent: 60-11525 (1985-01-01), None
patent: 60-190418 (1985-09-01), None
patent: 60-190418 (1985-09-01), None
patent: 60-219756 (1985-11-01), None
patent: 4-68019 (1992-03-01), None
patent: 4-249525 (1992-09-01), None
patent: 5-214074 (1993-08-01), None
patent: 6-49329 (1994-02-01), None
patent: 6-228279 (1994-08-01), None
patent: 10-135255 (1998-05-01), None
patent: WO 99/04430 (1999-01-01), None
Chemical abstracts registry No. 115-27-5 for chlorendic anhydrdide, 1974.
Chemical abstracts registry No. 2386-87-0 for 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 1974.
Lee, H. and Neville, K., Handbook of Epoxy Resins 1982 Reissue, 1982, pp. 5-18, McGraw-Hill, NY.
Blank, Z He and Picci, M., “Catalysis of the Epoxy-Carboxyl Reaction” Proceeding, Int. Waterborne, High-Solids and Powder Coatings Symposium, Feb. 21-23, 2001, New Orleans, LA.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Low voiding no flow fluxing underfill for electronic devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low voiding no flow fluxing underfill for electronic devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low voiding no flow fluxing underfill for electronic devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3729835

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.