Low VOC epoxy silane oligomer and compositions containing same

Details Low VOC epoxy silane oligomer and compositions containing same Low VOC epoxy silane oligomer and compositions containing same

2011-03-15

2011-03-15

Gulakowski, Randy (Department: 1766)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

C528S010000, C528S012000, C528S018000, C528S029000, C528S032000, C528S034000, C556S450000

Reexamination Certificate

active

07906604

ABSTRACT:
A process for producing a low VOC epoxy silane oligomer which includes hydrolyzing an epoxy silane, the epoxy silane upon hydrolysis of its hydrolyzable sites producing a reduced amount of volatile organic compound compared to that produced by the hydrolysis of a silane possessing an equivalent number of hydrolyzable sites all of which are hydrolyzable alkoxy groups, the hydrolyzing of the epoxy silane being carried out with less than 1.5 equivalents of water, said water being continuously fed during the hydrolysis reaction.

REFERENCES:
patent: 3337496 (1967-08-01), Pines et al.
patent: 4577460 (1986-03-01), Wirsching
patent: 5073195 (1991-12-01), Cuthbert
patent: 5868819 (1999-02-01), Guhde et al.
patent: 6656607 (1999-02-01), Rouquier et al.
patent: 6069259 (2000-05-01), Crivello
patent: 6270884 (2001-08-01), Guhde et al.
patent: 6391999 (2002-05-01), Crivello
patent: 7595372 (2009-09-01), Lejeune et al.
patent: 2006/0036034 (2006-02-01), Chaves et al.
patent: 2006/0225613 (2006-10-01), Lejeune
patent: 2006/0293480 (2006-12-01), Landon et al.

Affiliated with

Also associated with

Rating

Low VOC epoxy silane oligomer and compositions containing same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low VOC epoxy silane oligomer and compositions containing same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low VOC epoxy silane oligomer and compositions containing same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2641758