Low viscosity-increment fumed-silica and its slurry

Details Low viscosity-increment fumed-silica and its slurry Low viscosity-increment fumed-silica and its slurry

2007-08-14

2007-08-14

Nguyen, Ngoc-Yen (Department: 1754)

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

C423S336000, C423S337000, C106S003000, C106S031130, C106S287340, C106S482000, C051S309000

Reexamination Certificate

active

10326542

ABSTRACT:
A fumed-silica, which can make a slurry having sufficient wettability to a polar liquid, excellent dispersibility, and low viscosity even in the high concentration, and a slurry thereof. A fumed-silica and its slurry are provided, wherein the water content is controlled so that a weight loss after drying Y, and a dynamic wetting rate to water Z, have specified values.

REFERENCES:
patent: 4208316 (1980-06-01), Nauroth et al.
patent: 4356116 (1982-10-01), Beers
patent: 4454288 (1984-06-01), Lee et al.
patent: 4874518 (1989-10-01), Kirkland et al.
patent: 4985477 (1991-01-01), Collins et al.
patent: 5342597 (1994-08-01), Tunison, III
patent: 5776240 (1998-07-01), Deller et al.
patent: 5897675 (1999-04-01), Mangold et al.
patent: 6077640 (2000-06-01), Komai et al.
patent: 6193795 (2001-02-01), Nargiello et al.
patent: 2002/0077388 (2002-06-01), Meyer et al.
patent: 2002/0177311 (2002-11-01), Schumacher et al.
patent: 2003/0094593 (2003-05-01), Hellring et al.
patent: 2003/0140657 (2003-07-01), Oswald et al.

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