Low vapor pressure gas distribution system and method

Details Low vapor pressure gas distribution system and method Low vapor pressure gas distribution system and method

1999-03-25

2000-11-21

Rivell, John

Fluid handling

Diverse fluid containing pressure systems

Gas pressure storage over or displacement of liquid

137563, F04F 118

Patent

active

06148847&

ABSTRACT:
A system and method for distributing a low vapor pressure gas to one or more points of use in which a recirculation path and a recirculation device are provided. The recirculation path includes a distribution conduit in communication with the point(s) of use to allow the low vapor pressure gas to continually circulate to and from the point(s) of use. The recirculation device is positioned within the recirculation path to circulate said low vapor pressure gas continually through said recirculation path. In such manner, the low vapor pressure gas may be circulated at low pressure to prevent condensation. Further, the low vapor pressure gas may be circulated as a saturated gas mixture with a carrier gas. This may be effectuated by sparging the carrier gas through a vessel containing a liquid phase of a substance making up the low vapor pressure gas. Further the temperature of such liquid phase may be controlled to prevent condensation of the low vapor pressure gas.

REFERENCES:
patent: 4235829 (1980-11-01), Partus
patent: 4859375 (1989-08-01), Lipisko et al.
patent: 5148945 (1992-09-01), Geatz
patent: 5160429 (1992-11-01), Ohmi et al.
patent: 5287873 (1994-02-01), Venet
patent: 5330072 (1994-07-01), Ferri, Jr. et al.
patent: 5417346 (1995-05-01), Ferri, Jr. et al.
patent: 5673562 (1997-10-01), Friedt
patent: 6019114 (2000-02-01), Rodgers
Fine et al.-Seminconductor International, Oct. 1995, pp. 138-146.
Verma et al.-Seminconductor International, Jul. 1997, pp. 253-260.
Reppert et al.-Seminconductor International, Oct 1996, pp. 187-194.

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