Chemical apparatus and process disinfecting – deodorizing – preser – Process disinfecting – preserving – deodorizing – or sterilizing – Using direct contact steam to disinfect or sterilize
Patent
1987-05-27
1990-07-31
Warden, Robert J.
Chemical apparatus and process disinfecting, deodorizing, preser
Process disinfecting, preserving, deodorizing, or sterilizing
Using direct contact steam to disinfect or sterilize
422 33, 422 39, 422107, 422109, 422110, 422295, A61L 206
Patent
active
049449192
ABSTRACT:
An apparatus for exposing objects to saturated steam at subatmospheric pressure is computer controlled during a conditioning phase prior to the commencement of an exposure phase to apply vacuum to a sealed chamber while steam is simultaneously being injected to that chamber. The fluid stream flowing through the chamber sweeps air and condensate from the chamber and creates a partial vacuum within the chamber. The steam flow rate is controlled to establish the desired exposure temperature within the chamber. Vacuum is controlled to establish an exposure pressure at which steam is saturated at the exposure temperature. The exposure phase commences after the exposure temperature and pressure are established within the chamber.
REFERENCES:
patent: 4203947 (1980-05-01), Young et al.
patent: 4238447 (1980-12-01), Wolff
patent: 4261950 (1981-04-01), Bainbridge et al.
patent: 4296067 (1981-10-01), Nasman et al.
patent: 4309381 (1982-01-01), Chamberlain et al.
patent: 4372916 (1983-02-01), Chamberlain et al.
patent: 4395383 (1983-07-01), Kackos
patent: 4497773 (1985-02-01), Kuelzow et al.
patent: 4687635 (1987-08-01), Kaehler et al.
Kummert Lynn
MDT Corporation
Warden Robert J.
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