Low temperature separation of fluids by formation of phases havi

Gas separation – Means within gas stream for conducting concentrate to collector

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55 27, 55 48, 55 73, B01D 500

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active

046041079

ABSTRACT:
For the separation of fluid mixtures, the mixture is cooled sufficiently to form more than two phases of differing densities, and especially two liquid phases. The individual phases are then separated in correspondence with their densities. The process is especially applicable as a pretreatment in the absorptive removal of sour gases from gaseous mixtures as well as in the regeneration of a solvent loaded with gaseous impurities.

REFERENCES:
patent: 2490454 (1949-12-01), Myers
patent: 2863527 (1958-12-01), Herbert et al.
patent: 3001373 (1961-09-01), Eastman et al.
patent: 3116987 (1964-01-01), Honerkamp et al.
patent: 3398544 (1968-08-01), Crownover
patent: 3753335 (1973-08-01), Morris
patent: 3764665 (1973-10-01), Groenendaal et al.
patent: 3899312 (1975-08-01), Kruis et al.
patent: 3926591 (1975-12-01), Wildmoser et al.
patent: 4038332 (1977-07-01), Carter
patent: 4043770 (1977-08-01), Jakob
patent: 4115079 (1978-09-01), Pockrandt et al.
patent: 4371381 (1983-02-01), Schuftan
patent: 4522638 (1985-06-01), Karwat
Semyenova, T. A. and I. L. Leites, Moscow, "Kimiya" publishing house, 1977, Cleaning of Technological Gases.

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