Low temperature reduction process for photomasks

Details Low temperature reduction process for photomasks Low temperature reduction process for photomasks

1981-11-20

1983-06-28

Robinson, Ellis P.

Stock material or miscellaneous articles

Surface property or characteristic of web, sheet or block

Surface modified glass

65 3011, 65 3013, 65 32, 428433, 428434, 428192, B32B 1504, C03C 2100

Patent

active

043905927

ABSTRACT:
Glass photomasks having a high resolution stain pattern for use in photofabrication processes are made by migrating stain-producing ions into the surface of a glass substrate, and reducing and agglomerating the stain-producing ions in the presence of pure hydrogen under pressure at relatively low temperatures to produce a high resolution stain pattern.

REFERENCES:
patent: 2732298 (1956-01-01), Stookey
patent: 2911749 (1959-11-01), Stookey
patent: 2927042 (1960-03-01), Hall et al.
patent: 3118788 (1964-01-01), Hensler
patent: 3429749 (1969-02-01), Grego
patent: 3561963 (1971-02-01), Kiba
patent: 3573948 (1971-04-01), Tarnopol
patent: 3620795 (1971-11-01), Kiba
patent: 3732792 (1973-05-01), Tarnopol et al.
patent: 4155735 (1979-05-01), Ernsberger
patent: 4253861 (1981-03-01), Graff
patent: 4309495 (1982-01-01), Ernsberger

Affiliated with

Also associated with

Rating

Low temperature reduction process for photomasks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low temperature reduction process for photomasks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low temperature reduction process for photomasks will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-933735