Low temperature reduction process for large photomasks

Details Low temperature reduction process for large photomasks Low temperature reduction process for large photomasks

1981-11-20

1983-10-04

Fisher, Richard V.

Stock material or miscellaneous articles

Surface property or characteristic of web, sheet or block

Surface modified glass

65 3013, 65 32, C03C 2100

Patent

active

044078919

ABSTRACT:
Glass photomasks having a high resolution stain pattern for use in photolithographic processes are made by migrating stain-producing cations into a surface of the glass, and heating the glass containing the stain-producing cations in a pressure vessel containing an inert liquid saturated with hydrogen under pressure at relatively low temperatures to reduce and agglomerate the stain-producing cations to form a high resolution stain pattern.

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patent: 3620795 (1971-11-01), Kiba
patent: 3732792 (1973-05-01), Tarnopol et al.
patent: 4155735 (1979-05-01), Ernsberger
patent: 4309495 (1982-01-01), Ernsberger

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