Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component
Patent
1990-01-19
1992-05-05
Langel, Wayne A.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Carbon dioxide or hydrogen sulfide component
55 31, 55 33, 55 68, 55 76, 422189, 423247, 423248, C01B 3118, C01B 3120, C01B 358
Patent
active
051105691
ABSTRACT:
A process for removing the impurities carbon monoxide, carbon dioxide, water vapor and, optionally, hydrogen from a feed stream comprising initially removing water and carbon dioxide, oxidizing carbon monoxide and hydrogen to form carbon dioxide and water vapor, respectively, and removing the oxidation products. The process may be conducted batchwise or continuously by carrying out purification in a plurality of treatment zones wherein one or more zones are being regenerated while one or more others are purifying the feed stream.
REFERENCES:
patent: 3672824 (1972-06-01), Tamura et al.
patent: 3758666 (1973-09-01), Frevel et al.
patent: 3885927 (1975-05-01), Sherman et al.
patent: 4054428 (1977-10-01), Foltz
patent: 4448757 (1984-05-01), Barnwell et al.
patent: 4579723 (1986-04-01), Weltmer et al.
patent: 4713224 (1987-12-01), Tumhankar et al.
patent: 4816237 (1989-03-01), Tomomura et al.
patent: 4869883 (1989-09-01), Thorogood et al.
IOMA Broadcaster, Jan.-Feb. 1984, pp. 15-20.
Application of PSA to the Removal of Trace Components by Tomomura Masaomi and Nogita, vol. 13, No. 5, 1987, pp. 548-553.
Langel Wayne A.
Pearlman Robert I.
Reap Coleman R.
The BOC Group Inc.
LandOfFree
Low temperature purification of gases does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Low temperature purification of gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low temperature purification of gases will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1411050