Low temperature process for the formation of ceramic coatings

Details Low temperature process for the formation of ceramic coatings Low temperature process for the formation of ceramic coatings

1989-02-21

1994-08-09

Nelson, Peter A.

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427527, 427567, B05D 500

Patent

active

053365321

ABSTRACT:
A single or multilayer ceramic or ceramic-like coating process is provided which can be applied to heat sensitive substrates such as electronic devices. The process includes the steps of coating the substrate with a solution comprising a hydrogen silsesquioxane resin diluted in a solvent and then evaporating the solvent, thereby depositing a preceramic coating on the substrate. The preceramic coating is then ceramified to a silicon dioxide-containing ceramic by heating the preceramic coating to a temperature of between about 40.degree. to about 400.degree. C. in the presence of ozone which enhances the rate at which the ceramification proceeds and permits the ceramification of the coating to proceed at low temperatures. Additional layers of ceramic materials may be deposited over the initial layer and act as passivating and/or barrier protective layers.

REFERENCES:
patent: 4472510 (1984-09-01), January
patent: 4753855 (1988-06-01), Haluska et al.
patent: 4756977 (1988-07-01), Haluska et al.
patent: 4808653 (1989-02-01), Haluska et al.
patent: 4822697 (1989-04-01), Haluska et al.
Spialter et al, "On The Mechanism of the Reaction of Ozone with the Silicon-Hydrogen Bond", J. Am. Chem. Soc. 93:22, (1971).

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