Stock material or miscellaneous articles – Composite – Of silicon containing
Patent
1981-03-26
1983-02-01
Childs, S. L.
Stock material or miscellaneous articles
Composite
Of silicon containing
2041571R, 427 531, 427 541, 427 82, 427 93, 4272481, 427255, 4272553, 428450, 428457, 428469, 428699, 428701, B32B 904, B32B 1304
Patent
active
043715877
ABSTRACT:
The specification discloses a low temperature process for depositing oxide layers on a substrate by photochemical vapor deposition, by exposing the substrate to a selected vapor phase reactant in the presence of photochemically generated neutral (un-ionized) oxygen atoms. The oxygen atoms react with the vapor phase reactant to form the desired oxide, which deposits as a layer on the substrate. The use of photochemically generated neutral oxygen atoms avoids damage to the substrate due to charge bombardment or radiation bombardment of the substrate. The deposited oxide layer may optionally incorporate a selected dopant material in order to modify the physical, electrical, or optical characteristics of the oxide layer.
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Bethurum William J.
Childs S. L.
Hughes Aircraft Company
Karambelas A. W.
Lachman Mary E.
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