Electric lamp or space discharge component or device manufacturi – Process – Including cleaning
Patent
1994-07-06
1995-11-28
Bradley, P. Austin
Electric lamp or space discharge component or device manufacturi
Process
Including cleaning
445 73, H01J 938, H01J 912
Patent
active
054702666
ABSTRACT:
A low temperature apparatus and process exists for cleaning photo-cathodes used A lo VW pV:image intensifier tubes. The process comprises the steps of applying atomic or molecular particles of a plasma to a photo-cathode for the purpose of removing contaminants, such as oxides, from the photo-cathode surface; and applying heat or ultra-violet radiation to the photo-cathode to remove remaining impurities. The apparatus comprises means for subjecting a photo-cathode to the atomic and molecular particle products of a plasma, and preferably, means for applying heat or ultra-violet radiation to the photo-cathode at a low temperature to remove any remaining impurities from the photo-cathode.
REFERENCES:
patent: 1927812 (1933-09-01), Thomson
patent: 4153317 (1979-05-01), Ljung et al.
patent: 4799911 (1989-01-01), Relder
patent: 4954717 (1990-09-01), Sakamoto et al.
patent: 5029963 (1991-07-01), Naselli et al.
patent: 5244428 (1993-09-01), Welsch et al.
patent: 5314363 (1994-05-01), Murray
Sherk et al., "Cleaning and Enhancing the Characteristics of a Gas Discharge Panel," IBM Tech. Discl. Bull., 20 [12] (May 1978): 5209.
Peckman Robert
Peregoy, Jr. Weston K.
Stanley Donald H.
Bradley P. Austin
Hogan Patrick M.
ITT Corporation
Knapp Jeffrey T.
Plevy Arthur L.
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