Low-temperature plasma deposited hydrogenated amorphous...

Coating processes – Optical element produced – Transparent base

Reexamination Certificate

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C427S162000, C427S249100, C427S249170

Reexamination Certificate

active

10991985

ABSTRACT:
A method of forming a hydrogenated amorphous germanium carbon (α-GeCx:H) film on a surface of an infrared (IR) transmissive material such as a chalcogenide is provided. The method includes positioning an IR transmissive material in a reactor chamber of a parallel plate plasma reactor and thereafter depositing a hydrogenated amorphous germanium carbon (α-GeCx:H) film on a surface of the IR transmissive material. The depositing is performed at a substrate temperature of about 130° C. or less and in the presence of a plasma which is derived from a gas mixture including a source of germanium, an inert gas, and optionally hydrogen. Optical transmissive components, such as IR sensors and windows, that have improved abrasion-resistance are also provided.

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