Low-temperature plasma deposited hydrogenated amorphous...

Stock material or miscellaneous articles – Self-sustaining carbon mass or layer with impregnant or...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C428S698000, C428S336000

Reexamination Certificate

active

06844070

ABSTRACT:
A method of forming a hydrogenated amorphous germanium carbon (a-GeCx:H) film on a surface of an infrared (IR) transmissive material such as a chalcogenide is provided. The method includes positioning an IR transmissive material in a reactor chamber of a parallel plate plasma reactor and thereafter depositing a hydrogenated amorphous germanium carbon (a-GeCx:H) film on a surface of the IR transmissive material. The depositing is performed at a substrate temperature of about 130° C. or less and in the presence of a plasma which is derived from a gas mixture including a source of germanium, an inert gas, and optionally hydrogen. Optical transmissive components, such as IR sensors and windows, that have improved abrasion-resistance are also provided.

REFERENCES:
patent: 4704339 (1987-11-01), Green et al.
patent: 4740442 (1988-04-01), Waddel et al.
patent: 4859536 (1989-08-01), Waddel et al.
patent: 5007689 (1991-04-01), Kelly et al.
patent: 5365345 (1994-11-01), Propst et al.
patent: 5718976 (1998-02-01), Dorfman et al.
patent: 5723207 (1998-03-01), Lettington et al.
patent: 6086796 (2000-07-01), Brown et al.
patent: 2280201 (1995-01-01), None
patent: 61105551 (1986-05-01), None
patent: 01009401 (1989-01-01), None
Klocek, “Window and Dome Technologies and Materials”, SPIE-The International Society fop Optical Engineering, vol. 1112, pp. 154-161, (1989).
J.M. Mackowski, et al., “Rain Erosion Behaviour of Germanium Carbide (GeC) Films Grown on ZnS Substrates”, SPIE-vol. 1760, Window and Dome Technologies and Materials III, pp. 201-209, (1992).
Klocek, “Window and Dome Technologies and Materials IV”, SPIE-vol. 2286, pp. 273-284 (1994).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Low-temperature plasma deposited hydrogenated amorphous... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low-temperature plasma deposited hydrogenated amorphous..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low-temperature plasma deposited hydrogenated amorphous... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3435185

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.