Low temperature organometallic deposition of metals

Coating processes – Coating by vapor – gas – or smoke – Metal coating

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427 531, 427 541, 427124, 427125, 427 99, B05D 306, B05D 512, C23C 1600

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051301725

ABSTRACT:
A process for coating metal on a substrate. The process uses organometallic compounds such as (trimethyl)(cyclopentadienyl) platinum in the presence of a reducing fluid such as hydrogen gas to produce high purity films capable of selective deposition on substrates containing, for example, tungsten and silicon. The films are deposited using chemical vapor deposition (CVD) or gas phase laser deposition. The invention also comprises devices made from the process of the invention.

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