Low temperature methods for forming patterned electrically...

Details Low temperature methods for forming patterned electrically... Low temperature methods for forming patterned electrically...

2006-09-21

2009-08-11

Smith, Zandra (Department: 2822)

Semiconductor device manufacturing: process

Miscellaneous

C438S962000, C977S892000, C977S893000, C257SE51040

Reexamination Certificate

active

07572743

ABSTRACT:
A method of forming patterned thin films includes the steps of providing a porous membrane and a solution including a plurality of solid constituents and at least one surface stabilizing agent for preventing the solid constituents from flocculating out of suspension. The solution is dispensed onto a surface of the membrane. The solution is then removed by filtration through the membrane, wherein a patterned film coated membrane comprising a plurality of primarily spaced apart patterned regions are formed on the membrane. In one embodiment the method further includes the step of blocking liquid passage through selected portions of the membrane to form a plurality of open membrane portions and a plurality of blocked membrane portions before the dispensing step. The dispensing step includes ink jet printing the solution. An article having a patterned nanotube-including film thereon includes a substrate, and a patterned nanotube including film disposed on the substrate. The film includes a plurality of primarily spaced apart patterned regions, wherein nanotubes in the film are preferentially aligned parallel to a long direction of the patterned regions. The preferential alignment is generally most pronounced towards an edge of the patterned regions.

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Web-page, “New ink-jet technology for the formation of ultra fine dots . . . ,” available at http://www.aist.go.jp/alst—e
ew—research/20020401/20020401.html.

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