Chemistry of inorganic compounds – Silicon or compound thereof – Binary compound
Patent
1991-02-08
1992-09-22
Langel, Wayne A.
Chemistry of inorganic compounds
Silicon or compound thereof
Binary compound
75343, 75366, 423289, 423297, 423346, 423409, 423411, 423412, 423439, 423440, 423592, 423606, 423607, 423608, 423625, 427249, 427253, 4272552, 4272553, C01B 21068, C01B 2106, C01B 3130, C01B 1322
Patent
active
051495147
ABSTRACT:
A low temperature process is described for forming a coating or powder comprising one or more metals or metal compounds by first reacting one or more metal reactants with a halide-containing reactant to form one or more reactive intermediates capable of reacting, disproportionating, or decomposing to form a coating or powder comprising the one or more metal reactants. When one or more metal compounds are formed, either as powders or as coatings, a third reactant may be injected into a second reaction zone in the reactor to contact the one or more reactive intermediates formed in the first reaction zone to thereby form one or more metal compounds such as metal nitrides, carbides, oxides, borides, or mixtures of same.
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Langel Wayne A.
SRI - International
Taylor John P.
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