Low temperature halogenation of alkanes

Organic compounds -- part of the class 532-570 series – Organic compounds – Halogen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

570252, C07C 1700, C07C 1900

Patent

active

052762262

ABSTRACT:
The invention relates to a process for selectively producing alkyl halides from alkanes, such as methane and ethane at relatively mild temperatures and pressures in an organic liquid phase in the presence of halogen and transition metal complex. The alkane may be neat if in a liquid form, or may be solubilized with a suitable organic solvent, if the alkane not a liquid at reaction conditions. The reaction is for a time, under conditions of temperature and pressure and in effective amounts that will permit the formation of alkyl halides. Optional hydrolysis to the corresponding alcohols may follow. The alkyl halides have utility as precursors for alternative fuels, such as methanol.

REFERENCES:
patent: 2644016 (1953-06-01), Furr et al.
patent: 2676998 (1954-04-01), Kuntz et al.
patent: 4523040 (1985-06-01), Olah
patent: 4746760 (1988-05-01), Bergman et al.
patent: 4849534 (1989-07-01), Bergman et al.
Kushch et al., "Kinetics and Mechanism of Methane Oxidation in Aqueous Solution of Platinum Complexes," Nouveau J. de Chimie 7 (12) pp. 729-733 (1983).
Goldshleger et al., "Reactions of Alkanes in Solutions of Chloride Complexes of Platinum", Russian J. of Phys. Chem. 45 (5) pp. 785-786 (1972).
Shilov et al., "Activation of Saturated Hydrocarbons by Metal Complexes in Solution", Coordination Chem. Reviews 24 (2/3) pp. 97-143 (1977), Amsterdam.
Horvath et al., "Low Temperature Methane Chlorination with Aqueous Platinum Chlorides in the Presence of Chlorine" (Abstract #499), Am. Chem. Soc., Div. of Inorg. Chem., 204th ACS National Meeting, Washington, D.C., Aug. 23-28, 1992.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Low temperature halogenation of alkanes does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low temperature halogenation of alkanes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low temperature halogenation of alkanes will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-308997

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.