Low temperature deposition of silicon oxides for device fabricat

Details Low temperature deposition of silicon oxides for device fabricat Low temperature deposition of silicon oxides for device fabricat

1993-09-03

1997-07-01

Nguyen, Nam

Fishing, trapping, and vermin destroying

437235, 427574, 427579, H01L 2102

Patent

active

056438389

ABSTRACT:
The use of a deposition process involving a plasma struck in a gas including tetraethoxysilane and a source of oxygen yields, at low temperatures, conformal coatings of silicon dioxide. This process has significant implications for semiconductor device fabrication involving the deposition of a dielectric over a metallic non-planar structure.

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