Low temperature deposition of silicon dioxide using organosilane

Details Low temperature deposition of silicon dioxide using organosilane Low temperature deposition of silicon dioxide using organosilane

1996-07-11

1998-04-28

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

4272552, 4272551, 427255, 427314, C23C 1640

Patent

active

057441960

ABSTRACT:
The present invention is a process for very low temperature chemical vapor deposition of silicon dioxide, comprising the steps of

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Handbook of Thin Film Technology, Maissell, Leon I. and Glang, Reinhard, editors McGraw Hill Book Company, New York, (1970). No Page Number.
"Silicon Processing for the VLSI Era," Wolf, Stanley, and Tauber, Richard N., editors, Lattice Press, Sunset Beach, California, pp. 182-191,(1986).
A. K. Hochberg and D. A. Roberts, Mat. Res. Soc. Symp. Proc. vol. 282, pp. 569-574, (1993), Material Research Society.
A. K. Hochberg and D. L. O'Meara, J. Electrochem. Soc., vol. 136, pp. 1843-1844, (1989).
Bennet, B. R., et al. Appl. Phys. Lett. 50(4), pp. 197-199, (1987).
Chapple-Sokol, J. D., Gordon, R. G., Thin Solid Films, 171, (1989) pp. 291-305.
Barry Gelernt, Semiconductor International, "Selecting an Organosilicon Source for LPCVD Oxide," Cahners Publishing Co., Mar. 1990. No Page Number .

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