Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Reexamination Certificate
2006-02-28
2006-02-28
Guerrero, Maria F. (Department: 2822)
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
C438S240000, C438S785000
Reexamination Certificate
active
07005303
ABSTRACT:
A low temperature CVD process for deposition of bismuth-containing ceramic thin films suitable for integration to fabricate ferroelectric memory devices. The bismuth-containing film can be formed using a tris(β-diketonate) bismuth precursor. Films of amorphous SBT can be formed by CVD and then ferroannealed to produce films with Aurivillius phase composition having superior ferroelectric properties suitable for manufacturing high density FRAMs.
REFERENCES:
patent: 4975299 (1990-12-01), Mir et al.
patent: 5431957 (1995-07-01), Gardiner et al.
patent: 5478610 (1995-12-01), Desu et al.
patent: 5519566 (1996-05-01), Perino et al.
patent: 5648114 (1997-07-01), Paz De Araujo et al.
patent: 5902639 (1999-05-01), Glassman et al.
patent: 6133051 (2000-10-01), Hintermaier et al.
patent: 6177135 (2001-01-01), Hintermaier et al.
patent: 6500489 (2002-12-01), Hintermaier et al.
Tingakai Li, et al: “Surface structure and morphology of SrBi2Ta209(SBT) thin films”, Structure and Evolution of Surfaces, Symposium, Structure and Evolution of surfaces. Symposium, Boston, MA, USA, Dec. 2-5, 1996, pp. 407-412, XXP000900049 1997 Pittsburg, PA, Mater. Res. Soc.
Bunshah, et al., “Deposition Technologies for Films and Coatings.” 1982. 357-359.
Baum Thomas H.
Dehm Christine
Desrochers Debra A.
Hendrix Bryan C.
Hintermaier Frank S.
Advanced Technology & Materials Inc.
Chappuis Margaret
Fuierer Marianne
Fuierer Tristan A.
Guerrero Maria F.
LandOfFree
Low temperature chemical vapor deposition process for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Low temperature chemical vapor deposition process for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low temperature chemical vapor deposition process for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3625772