Low temperature chemical vapor deposition of protective coating

Details Low temperature chemical vapor deposition of protective coating Low temperature chemical vapor deposition of protective coating

1994-10-03

1996-02-27

King, Roy V.

Coating processes

Interior of hollow article coating

Coating by vapor, gas, mist, or smoke

427238, 427239, 427250, 427253, 4272551, 4272552, 4272557, 427124, 427125, 4273837, B05D 722, C23C 1600

Patent

active

054947049

ABSTRACT:
A method is disclosed to deposit aluminum and platinum on substrates for improved corrosion, oxidation, and erosion protection. Low temperature chemical vapor deposition is used. A homogeneous biphase coating of aluminum and platinum may be deposited, as well as sequential layers of aluminum and platinum.

REFERENCES:
patent: 5130172 (1992-07-01), Hicks et al.
patent: 5139824 (1992-08-01), Liburdi et al.
John L. Vossen, and Werner Kern, "Thin Film Processes," Academic Press, (1978) pp. 258-331.
Sasaoka et al, Appl. Phys. Lett. 55(8), Aug. 1989, pp. 741-743.
Vargas et al, Appl. Phys. Lett. 65(9), Aug. 1994, pp. 1094-1096.

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