Optical: systems and elements – Deflection using a moving element – By moving a reflective element
Patent
1994-02-04
1997-02-11
Phan, James
Optical: systems and elements
Deflection using a moving element
By moving a reflective element
359230, 348771, 310 40MM, G02B 2608, G02B 2602
Patent
active
056026714
ABSTRACT:
It is possible to use an oriented monolayer to limit the Van der Waals forces between two elements by passivation. An oriented monolayer (34) is formed on a surface of a micromechanical device. When the surface comes in contact with another surface, the oriented monolayer decreases the Van der Waals forces to reduce the attraction between the surfaces.
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Donaldson Richard L.
Kesterson James C.
Phan James
Reed Julie L.
Texas Instruments Incorporated
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