Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1983-05-23
1985-07-02
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430169, 430192, 430193, 430326, G03C 160, G03C 154, G03F 726
Patent
active
045268568
ABSTRACT:
A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in integrated circuit manufacture. The essential component in this invention is the solvent composition which consists of cyclopentanone (or cyclopentanone-cyclohexanone blend) in combination with an aliphatic alcohol of 5-12 carbon atoms. These solvent components when used in certain specific ratios provide unexpectedly good wetting of various substrates and low striation films.
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DeForest W. S., "Photoresist Matl's and Processes", McGraw Hill, 1975, pp. 48 and 133.
Elliott D. J., "Integrated Circuit Fabrication Tech.", McGraw Hill, 1982, p. 71.
Thompson L. F., "Introduction to Microlithography", ACS Symposium Series 219, 1983, p. 114.
Lewis James M.
Owens Robert A.
Rinehart Robert E.
Sweeney Richard F.
Wake Ronald W.
Allied Corporation
Bowers Jr. Charles L.
Friedenson Jay P.
Plantamura Arthur J.
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