Low stress polysilicon microstructures

Details Low stress polysilicon microstructures Low stress polysilicon microstructures

1990-03-16

1991-10-22

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437201, 437901, 437921, 437927, 357 26, 73754, 73777, 148DIG73, 148DIG159, H01L 2144

Patent

active

050595563

ABSTRACT:
Method for relieving stress in silicon microstructures by forming a silicide on the microstructures. Sensors comprising a stress-relieved silicon microstructure are also described.

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Muraka "Refractory Silicides for Integrated Circuits", J. Vac. Sci. Technol. 17(4) Aug. 1980, 775-792.
Collins et al., "Tantalum and Cobalt . . . ", Applied Physics A40 (1986) Jun. 16, No. 1 35-49.
Muraka "Codeposited Silicides . . . ", 2194 Thin Solid Films, 140 (1986) Jun. 16, No. 1, 35-49.
Suguro et al., "Impurity Effect on . . . ", Japan Soc. of Appl. Physics, 434-436.
Wolf et al., Silicon Processing for the VLSI Era, vol. 1, Lattice Press, Inc., Sunset Beach, CA (1986), pp. 390-394.
Lee et al., "Silicon Micromachining Technology . . . ", SAE Technical Papers, pp. 1-10.
Allan, Roger, "Sensors in Silicon", High Technology/Sep. 1984, pp. 43-77.

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