Low stress electrodeposition of gold for X-ray mask fabrication

Details Low stress electrodeposition of gold for X-ray mask fabrication Low stress electrodeposition of gold for X-ray mask fabrication

1992-08-07

1994-06-07

Rosasco, Steve

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

205266, 430 5, C25D 1300

Patent

active

053186877

ABSTRACT:
An electrodeposition process for producing gold masks for X-ray lithography of integrated circuits is disclosed. The process produces a gold layer of tightly controlled grain size and arsenic content which results in minimum stress in the gold film and therefore minimum distortion in the features produced from the mask. The process comprises (a) immersing a substrate in a solution containing from 6 to 9 grams of gold per liter and from 8 to 30 mg of arsenite per liter, and (b) passing an electric current having a current density of 1 to 5 mA per cm.sup.2 through the solution to cause electrodeposition of gold.

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