Low stress electrodeposition of gold for x-ray mask fabrication

Details Low stress electrodeposition of gold for x-ray mask fabrication Low stress electrodeposition of gold for x-ray mask fabrication

1994-03-08

1995-10-17

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, 378 34, 378 35, G03F 900

Patent

active

054590019

ABSTRACT:
An electrodeposition process for producing gold masks for X-ray lithography of integrated circuits is disclosed. The process produces a gold layer of tightly controlled grain size and arsenic content which results in minimum stress in the gold film and therefore minimum distortion in the features produced from the mask. The process comprises (a) immersing a substrate in a solution containing from 6 to 9 grams of gold per liter and from 8 to 30 mg of arsenite per liter, and (b) passing an electric current having a current density of 1 to 5 mA per cm.sup.2 through the solution to cause electrodeposition of gold.

REFERENCES:
patent: 4468799 (1984-08-01), Harms et al.
patent: 4515876 (1985-05-01), Yoshihara et al.
patent: 4647517 (1987-03-01), Hersener et al.
patent: 4698285 (1987-10-01), Ehrfeld et al.
patent: 4873162 (1989-10-01), Yoshioka et al.
patent: 4946751 (1990-08-01), Bruns et al.
patent: 4998267 (1991-03-01), Lee et al.
patent: 5057388 (1991-10-01), Yahalom
patent: 5096791 (1992-03-01), Yahalom
patent: 5266183 (1993-11-01), Dauksher et al.
Chu et al. "Low Stress Electroplating For X-ray Masks" Microelectronic Engineering 17, pp. 3324-3226, (1992). (Jun. 1992).
Nash et al. "H-ray Mask Process-Induced Distortion Study" J. Vac. Sci. Technol. B9 (6), pp. 3324-3328, (1991). (Nov. 1991).
Sel-Rex Technical Data Sheet, Nov. 1988. (May 1988).
Becker et al. "A High Resolution Dimensional Metrology Syustem for Masks" SPIE 775, pp. 120-125, (1987). (Mar. 1987).
Armitage et al. "Analysis of Overlay Distortion Patterns" SPIE, 921, pp. 207-222, (1988). (Mar. 1988).
Chiu et al. "Electrodeposition of Low Stress Gold for X-ray Mask" J. Vac. Sci. Technolo. B8 (6), pp. 1589-1594, (1990). (Nov. 1990).
Ogawa et al. "Stress-Controlled X-ray Mask Absorber Using Pulse-Current Gold Plating" J. Vac. Sci. Technol. B10 (3), pp. 1193-1196, (1992). (Jun. 1992).

Affiliated with

Also associated with

Rating

Low stress electrodeposition of gold for x-ray mask fabrication does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low stress electrodeposition of gold for x-ray mask fabrication, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low stress electrodeposition of gold for x-ray mask fabrication will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-596337