Low resistance indium oxide coatings

Details Low resistance indium oxide coatings Low resistance indium oxide coatings

1978-11-29

1980-05-06

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192R, C23C 1500

Patent

active

042016495

ABSTRACT:
A method is disclosed for making low resistance thin indium oxide films by first depositing a thin primer layer of indium oxide at low temperature before heating to deposit the bulk of the conductive layer of indium oxide by cathode sputtering.

REFERENCES:
patent: 2825687 (1958-03-01), Preston et al.
patent: 3369989 (1968-02-01), Kay et al.
patent: 3655545 (1972-04-01), Gillery et al.
patent: 4094763 (1978-06-01), Gillery et al.
patent: 4113599 (1978-09-01), Gillery
J. C. C. Fan and F. J. Bachner, Properties of Sn-doped In.sub.2 O.sub.3 Films Prepared by RF Sputtering; J. Electrochem. Soc., vol. 122, No. 12, (Dec. 1975), pp. 1719-1725.
J. A. Thornton and Virgle L. Hedgcoth, Transparent Conductive Sn-doped Indium Oxide Coatings . . . ; J. Vac. Sci. Technol., vol. 13, No. 1 (Jan./Feb. 1976), pp. 117-121.
D. B. Fraser and H. D. Cook, Film Deposition with the Sputter Gun, J. Vac. Sci. Technol., vol. 14, No. 1 (Jan./Feb. 1977), pp. 147-151.

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