Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2007-07-19
2008-08-19
Boyer, Charles I (Department: 1796)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S238000, C510S362000, C510S382000, C510S384000, C510S438000, C510S391000, C510S432000, C510S470000
Reexamination Certificate
active
07414017
ABSTRACT:
Cleaning compositions containing C8-C10 alkylpolyglucosides, have low filming and streaking when combined with C2-C4 alcohols and propylene glycol ethers. The low filming and streaking occurs even in the presence of quaternary ammonium biocides.
REFERENCES:
patent: 4753844 (1988-06-01), Jones et al.
patent: 5342534 (1994-08-01), Skrobala et al.
patent: 5576284 (1996-11-01), Van Buskirk et al.
patent: 6159924 (2000-12-01), Weller et al.
patent: 6384010 (2002-05-01), Wagers
patent: 6489285 (2002-12-01), Faber
patent: 6642197 (2003-11-01), Cheung et al.
patent: 6716805 (2004-04-01), Sherry et al.
patent: 6743819 (2004-06-01), Manzer
patent: 6786223 (2004-09-01), Klinkhammer et al.
patent: 6814088 (2004-11-01), Barnabas et al.
patent: 6841527 (2005-01-01), Mitra et al.
patent: 6849589 (2005-02-01), Liu
patent: 6936580 (2005-08-01), Sherry et al.
patent: 7048806 (2006-05-01), Ochomogo et al.
patent: 7082951 (2006-08-01), Barnabas et al.
patent: 7094741 (2006-08-01), Barnabas et al.
patent: 2003/0100465 (2003-05-01), Kilkenny et al.
patent: 2003/0216281 (2003-11-01), DeLeo et al.
patent: 2005/0121054 (2005-06-01), Barnabas et al.
Burciaga Sonia H.
Kilkenny Andrew
Kong Stephen Bradford
Boyer Charles I
Peterson David
The Clorox Company
LandOfFree
Low residue cleaning solution comprising a C8-C10... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Low residue cleaning solution comprising a C8-C10..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low residue cleaning solution comprising a C8-C10... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4010250