Low residue aqueous hard surface cleaning and disinfecting compo

Details Low residue aqueous hard surface cleaning and disinfecting compo Low residue aqueous hard surface cleaning and disinfecting compo

1997-10-15

1999-07-27

Gupta, Yogendra N.

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

With halogen, nitrogen, oxygen, or phosphorus containing...

510199, 510235, 510237, 510362, 510363, 510382, 510409, 510411, 510424, 510490, 510503, 510504, C11D 175, C11D 162, C11D 343

Patent

active

059290161

ABSTRACT:
Aqueous based cleaning compositions simultaneously featuring disinfecting, low residue deposit and good cleaning characteristics are provided. The compositions include one or more quaternary amine compounds as disinfecting active agents, an organic solvent system which includes glycol mono-n-butyl ether or a binary system including a glycol ether with a linear primary alcohol, and either one or more betaines, or one or more amine oxides as a surfactant constituent.

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Copy of GB Search Report dated Jan. 17, 1997 for GB Application No. 9622176.7.
Copy of PCT Search Report dated Feb. 11, 1998 for PCT Application No. PCT/US97/18774.

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